Multi-fin finfet device including epitaxial growth barrier on outside surfaces of outermost fins and related methods

ABSTRACT

A multi-fin FINFET device may include a substrate and a plurality of semiconductor fins extending upwardly from the substrate and being spaced apart along the substrate. Each semiconductor fin may have opposing first and second ends and a medial portion therebetween, and outermost fins of the plurality of semiconductor fins may comprise an epitaxial growth barrier on outside surfaces thereof. The FINFET may further include at least one gate overlying the medial portions of the semiconductor fins, a plurality of raised epitaxial semiconductor source regions between the semiconductor fins adjacent the first ends thereof, and a plurality of raised epitaxial semiconductor drain regions between the semiconductor fins adjacent the second ends thereof.

FIELD OF THE INVENTION

The present invention relates to the field of electronic devices, and, more particularly, to semiconductor devices and related methods.

BACKGROUND OF THE INVENTION

Semiconductor device technologies continue to evolve, providing higher chip density and operating frequencies. Fin-type field-effect transistors (FINFETs) are one type of transistor technology that is being used to help provide desired device scaling while maintaining appropriate power consumption budgets.

U.S. Pat. Pub. No. 2010/0203732 discloses a FINFET device and related method, in which each FINFET may have a width of sub-lithographic dimension. The method includes forming a mask having a plurality of openings atop a semiconductor-containing layer which is located on a substrate. An angled ion implantation is then performed to introduce dopants to a first portion of the semiconductor-containing layer, wherein a remaining portion that is substantially free of dopants is present beneath the mask. The first portion of the semiconductor-containing layer containing the dopants is thereafter removed selective to the remaining portion of semiconductor-containing layer that is substantially free of the dopants to provide a pattern. The pattern is then transferred into the substrate to provide a fin structure having a width of sub-lithographic dimension.

Another type of FINFET device is the multi-fin FINFET. This device typically includes a plurality of spaced apart semiconductor fins with a tri-gate that overlies the fins. The effective gate width of a FINFET is 2nh, where n is the number of fins and h is the fin height. Thus, wider transistors with higher on-currents may be obtained by using multiple fins. Yet, higher numbers of fins may result in more complicated devices structures that can pose challenges to fabricate.

SUMMARY OF THE INVENTION

In view of the foregoing background, it is therefore an object of the present invention to provide a multi-fin FINFET device that is reliable and readily fabricated.

This and other objects, features, and advantages in accordance with the present invention are provided by a multi-fin FINFET device which may include a substrate and a plurality of semiconductor fins extending upwardly from the substrate and being spaced apart along the substrate. Each semiconductor fin may have opposing first and second ends and a medial portion therebetween, and outermost fins of the plurality of semiconductor fins may comprise an epitaxial growth barrier on outside surfaces thereof. The FINFET may further include at least one gate overlying the medial portions of the semiconductor fins, a plurality of raised epitaxial semiconductor source regions between the semiconductor fins adjacent the first ends thereof, and a plurality of raised epitaxial semiconductor drain regions between the semiconductor fins adjacent the second ends thereof. As such, epitaxial growth on the outside surfaces of the outermost fins may be avoided during growth of the raised epitaxial source and drain regions, which may advantageously result in a reduced likelihood of electrical shorting.

By way of example, the epitaxial growth barrier may comprise a compound comprising a semiconductor and at least one of carbon and fluorine. Furthermore, the plurality of semiconductor fins may comprise silicon, for example. More particularly, the plurality of semiconductor fins may comprise a first set of P-channel fins and a second set of N-channel fins spaced apart from the first set of P-channel fins to define a complementary metal-oxide semiconductor (CMOS) FINFET, and the at least one gate may comprise a respective gate for each of the first set of P-channel fins and the second set of N-channel fins.

The multi-fin FINFET device may further include a gate contact region coupled to the gate and extending upwardly from the substrate and spaced apart from the semiconductor fins. In addition, the multi-fin FINFET device may also include a source contact region coupled to the first ends of the plurality of semiconductor fins, and a drain contact region coupled to the second ends of the plurality of semiconductor fins.

A related method of making a multi-fin FINFET device may include forming a plurality of semiconductor fins extending upwardly from a substrate and being spaced apart along the substrate, where each semiconductor fin has opposing first and second ends and a medial portion therebetween. The method may further include forming at least one gate overlying the medial portions of the semiconductor fins, forming an epitaxial growth barrier on outside surfaces of outermost fins of the plurality of semiconductor fins, forming a plurality of raised epitaxial semiconductor source regions between the semiconductor fins adjacent the first ends thereof, and forming a plurality of raised epitaxial semiconductor drain regions between the semiconductor fins adjacent the second ends thereof.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a perspective view of a CMOS multi-fin FINFET device in accordance with the invention.

FIGS. 2A and 2B are side and top views, respectively, showing formation of the fins of the FINFET of FIG. 1.

FIGS. 3A and 3B are side and top views, respectively, showing formation of tri-gates on the fins of the FINFET of FIG. 1.

FIG. 4 is a side view showing an ion implantation step to form epitaxial growth barriers on outside surfaces of the outermost fins of the FINFET of FIG. 1.

FIGS. 5A and 5B are side and top views, respectively, showing formation of epitaxial source and drain regions of the FINFET of FIG. 1.

FIG. 6 is a flow diagram corresponding to the steps illustrated in FIGS. 2A, 2B, 3A, 3B, 4, 5A, and 5B.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

The present invention will now be described more fully hereinafter with reference to the accompanying drawings, in which preferred embodiments of the invention are shown. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art. Like numbers refer to like elements throughout.

Referring initially to FIGS. 1-5, a multi-fin FINFET device 30 and associated method aspects are first described. In the illustrated example, the FINFET 30 is a complementary metal oxide semiconductor (CMOS) device including an NFET and a PFET. The FINFET 30 may be configured to provide various devices such as memories, logic gates, etc., using the contact regions described further below. However, it should be noted that non-CMOS configurations may be used in different embodiments as well (i.e., individual NFETs or PFETs).

The FINFET 30 illustratively includes a substrate 31, which may be a semiconductor substrate (e.g., silicon, germanium, Si/Ge, etc.), a semiconductor on insulator (SOI) substrate, etc. Furthermore, a plurality of semiconductor fins 32 n, 32 p for respective NFET and PFET devices extend upwardly from the substrate 31, and are laterally spaced apart along the substrate (left to right in FIGS. 2A, 2B). In FIGS. 2A, to 5B, the NFET is on the left and the PFET is on the right. Each semiconductor fin 32 n, 32 p respectively has opposing first and second ends 33 a, 33 b and 34 a, 34 b, and a respective medial portion 35 a, 35 b therebetween (indicated with dashed lines in FIG. 2B). Outermost fins of the plurality of semiconductor fins (i.e., the fins 32 n, 32 p on the far left and right of their respective sets of fins) comprise an epitaxial growth barrier 35 n, 35 p on outside surfaces thereof, as will be described further below.

The FINFET 30 further illustratively includes respective gates 37 n, 37 p for the NFET and PFET, which overlie the respective medial portions 35 a, 35 b of the fins 32 n, 32 p. More particularly, the gates 37 n, 37 p are tri-gate structures, each of which may include an insulator layer and an electrode layer overlying the insulator layer. In addition, a plurality of raised epitaxial semiconductor source regions 38 n, 38 p extend between the semiconductor fins 32 n, 32 p adjacent the first ends 33 a, 34 a thereof, respectively. Moreover, a plurality of raised epitaxial semiconductor drain regions 39 n, 39 p extend between the semiconductor fins 32 n, 32 p adjacent the second ends 33 b, 34 b thereof. The FINFET 30 further illustratively includes gate contact regions 40 n, 40 p respectively coupled to the gates 37 n, 37 p and extending upwardly from the substrate 31 and spaced apart from the semiconductor fins 40 n, 40 p (FIG. 1). Similarly, respective source contact regions 41 n, 41 p are coupled to the first ends 33 a, 34 a of the semiconductor fins 32 n, 32 p, and respective drain contact regions 42 n, 42 p are coupled to the second ends 33 b, 34 b of the semiconductor fins 32 n, 32 p.

As noted above, multi-fin FINFETs are advantageous in that the effective gate width is 2nh, where n is the number of fins and h is the fin height. Accordingly, wider transistors with higher on-currents may be obtained by using multiple fins. However, when source/drain epitaxial growth is used to merge the fins 32 n, 32 p to lower the external resistance, epitaxial growth will otherwise occur between the two sets of fins. That is, not only is there intra-fin growth of the epitaxial semiconductor material between the fins 32 n, and 32 p, in a typical FINFET integration process there will be inter-fin growth between the two sets of fins, for example. This may otherwise be problematic in that it can cause shorting between the NFET and PFET fins 32 n, 32 p. The above-noted epitaxial growth barriers 36 n, 36 p advantageously help constrain epitaxial growth to intra-fin growth to interior or inner fin surfaces between the fins 32 n, 32 p, and thus reduce a likelihood of shorting between the NFET and PFET devices.

An example approach for fabricating the FINFET 30 with the epitaxial growth barriers 36 n, 36 p will now be described further with reference to the flow diagram 60 of FIG. 6. Beginning at Block 61, the semiconductor (e.g., silicon, germanium, Si/Ge, etc.) fins 32 n, 32 p are formed extending upwardly from the substrate 31 and are spaced apart along the substrate, as noted above, at Block 62 (FIGS. 2A and 2B). The gates 37 n, 37 p are then formed overlying the medial portions 35 a, 35 b of the semiconductor fins 32 n, 32 p, respectively, at Block 63. Again, with a tri-gate structure, the gates 37 n, 37 p (which respectively include an insulator layer and a gate electrode layer) will wrap around the top and side surfaces of the fins 32 n, 32 p, as seen in FIGS. 3A, 3B.

The method further includes forming the epitaxial growth barriers 36 n, 36 p on outside surfaces of the outermost fins from the sets of fins 32 n, 32 p, as noted above, at Block 64. More particularly, this may be done by performing an ion implantation at an angle α offset from normal to the substrate 31, as represented by the dashed arrows in FIG. 4. More particularly, a dual-angled implant/reactive ion etch (RIE) may be performed using Carbon-Fluorine (e.g., CF4) or other suitable gases. As a result, the epitaxial growth barriers 36 n, 36 p will comprise a compound including the semiconductor fin material (e.g., silicon, etc.), carbon and/or fluorine components. The epitaxial growth barriers 36 n, 36 p will appear as a film or coating, and they will inhibit grow of epitaxial semiconductor material during formation of the raised source regions 38 n, 38 p and drain regions 39 n, 39 p, at Blocks 65-66 (FIGS. 5A, 5B), which illustratively concludes the method shown in FIG. 6 (Block 67).

The angle of implantation a may be chosen so as not to be too steep, and thereby allow ion penetration too deep between the fins 32 n or 32 p, yet not too shallow so that the outside surfaces of the sets of fins facing one another do not get coated on the bottom (which would allow excessive inter-fin epitaxial growth that could result in shorting between the NFET and PFET devices, as described above). Generally speaking, the angle of implantation a may be in a range of 30 to 60 degrees, depending upon the height and lateral spacing of the fins 32 n, 32 p which are used in a given embodiment. Because the inner surfaces of the fins 32 n, 32 p are blocked from ion bombardment by the adjacent fins, these inner surfaces will have relatively little impact or damage from the implantation, and will thereby still allow for the subsequent epitaxial source and drain growth. With proper angle selection only a small portion of these inner surfaces near the tops of the fins 32 n, 32 p will be impacted by the implantation and thereby have epitaxial growth barriers 36 n, 36 p formed thereon, as shown in FIGS. 4 and 5A.

It will therefore be appreciated that that the above-described approach may be relatively easy to implement, in that an additional step (i.e., the ion implantation) may be added to a multi-fin FINFET fabrication process to provide the epitaxial growth barriers 36 n, 36 p and reduce the likelihood of shorting in the finished device. That is, the above-described approach advantageously allows for relatively high density multi-fin configurations to be fabricated without the epitaxial merging between the NFETs and PFETs. The epitaxial growth barriers 36 n, 36 p may provide desired retardation of epitaxial growth, so that this growth is confined to the inner surfaces of the fins 32 n, 32 p where desired.

Many modifications and other embodiments of the invention will come to the mind of one skilled in the art having the benefit of the teachings presented in the foregoing descriptions and the associated drawings. Therefore, it is understood that the invention is not to be limited to the specific embodiments disclosed, and that modifications and embodiments are intended to be included within the scope of the appended claims. 

1. A device, comprising: a substrate; a plurality of fins over the substrate, the plurality of fins including a first fin and a second fin, the first fin including a first sidewall surface and a second sidewall surface opposite to the first sidewall surface, the second fin including a third sidewall surface and a fourth sidewall surface opposite to the third sidewall surface, the second sidewall surface of the first fin facing the third sidewall surface of the second fin; a gate over the plurality of fins; a plurality of epitaxial source and drain structures positioned between the plurality of fins, ones of the plurality of epitaxy source and drain structures contacting the third sidewall surface and the second sidewall surface; and an epitaxial growth barrier layer over the first sidewall surface of the first fin.
 2. The device of claim 1, wherein the epitaxial growth barrier layer covers a portion of the second sidewall surface of the first fin that is distal from the substrate.
 3. The device of claim 1, wherein the first fin includes a first surface that meets with both the first sidewall surface and the second sidewall surface and is spaced apart from a surface of the substrate, and the epitaxial growth barrier layer is on the first surface.
 4. The device of claim 1, wherein the plurality of epitaxy source and drain structures each includes a convex cross-section shape.
 5. The device of claim 1, wherein the second fin includes a first end surface and a second end surface, and comprising a first contact structure surrounding the first end surface, a portion of the third sidewall surface, and a portion of the fourth sidewall surface.
 6. The device of claim 1, comprising a gate contact on a surface of the substrate and contacting a first end of the gate.
 7. The device of claim 1, wherein the epitaxial barrier layer is a compound including one or more of a semiconductor material of the first fin, carbon and fluorine.
 8. The device of claim 1, wherein the plurality of fins each includes a first dimension in a first direction transverse a surface of the substrate, and the plurality of epitaxial source and drain structures each includes a second dimension in the first direction, the second dimension being smaller than the first dimension.
 9. The device of claim 1, wherein the gate contacts at least a portion of each of the first sidewall surface, the second sidewall surface, the third sidewall surface and the fourth sidewall surface.
 10. A method, comprising: forming a plurality of fins over a substrate, the plurality of fins including a first fin and a second fin, the first fin including a first sidewall surface and a second sidewall surface opposite to the first sidewall surface, the second fin including a third sidewall surface and a fourth sidewall surface opposite to the third sidewall surface, the second sidewall surface of the first fin facing the third sidewall surface of the second fin; forming a gate over the plurality of fins; forming an epitaxial growth barrier layer on the first sidewall surface of the first fin; and forming a plurality of epitaxial source and drain structures positioned between the plurality of fins, ones of the plurality of epitaxy source and drain structures contacting the third sidewall surface and the second sidewall surface
 11. The method of claim 10, wherein the forming the epitaxial growth barrier layer includes forming the epitaxial growth barrier layer on a portion of the second sidewall surface of the first fin that is distal from the substrate.
 12. The method of claim 10, wherein the forming the epitaxial growth barrier layer includes forming the epitaxial growth barrier layer on a first surface of the first fin that meets with both the first sidewall surface and the second sidewall surface, the first surface being spaced apart from a surface of the substrate.
 13. The method of claim 10, wherein the forming the epitaxial growth barrier layer includes performing an ion implementation on the first surface of the first fin.
 14. The method of claim 13, wherein the ion implementation is performed at an angle offset from normal to a surface of the substrate.
 15. A method, comprising: forming a first plurality of fins extending from a surface of a substrate; forming a first gate structure on the first plurality of fins; forming a first source region between ones of the first plurality of fins on a first side of the first gate structure; forming a first drain region between ones of the first plurality of fins on a second side of the first gate structure; and forming a first contact extending over first ends of the first plurality of fins.
 16. The method of claim 15, comprising forming a second contact extending over second ends of the first plurality of fins.
 17. The method of claim 16, comprising forming a first gate contact on the surface of the substrate, the first gate contact being adjacent to the first contact and the second contact and contacting a first end of the first gate structure.
 18. The method of claim 17, comprising: forming a second plurality of fins extending from the surface of the substrate and being adjacent to the first plurality of fins; and forming a second gate structure on the second plurality of fins, the second gate structure having a first end that is adjacent to a second end of the first gate structure.
 19. The method of claim 18, comprising forming a second gate contact on the surface of the substrate, the second gate contact contacting a second end of the second gate structure.
 20. The method of claim 18, comprising: forming a second source region between ones of the second plurality of fins on a first side of the second gate structure; forming a second drain region between ones of the second plurality of fins on a second side of the second gate structure; forming a third contact extending over first ends of the second plurality of fins, the third contact being adjacent to the first contact; and forming a fourth contact extending over second ends of the second plurality of fins, the fourth contact being adjacent to the second contact. 